The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2011
Filed:
Jun. 28, 2006
Deenesh Padhi, Sunnyvale, CA (US);
Hyoung-chan Ha, San Jose, CA (US);
Sudha Rathi, San Jose, CA (US);
Derek R. Witty, Fremont, CA (US);
Chiu Chan, Foster City, CA (US);
Sohyun Park, Santa Clara, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Martin Jay Seamons, San Jose, CA (US);
Visweswaren Sivaramakrishnan, Cupertino, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Hichem M'saad, Santa Clara, CA (US);
Deenesh Padhi, Sunnyvale, CA (US);
Hyoung-Chan Ha, San Jose, CA (US);
Sudha Rathi, San Jose, CA (US);
Derek R. Witty, Fremont, CA (US);
Chiu Chan, Foster City, CA (US);
Sohyun Park, Santa Clara, CA (US);
Ganesh Balasubramanian, Sunnyvale, CA (US);
Karthik Janakiraman, San Jose, CA (US);
Martin Jay Seamons, San Jose, CA (US);
Visweswaren Sivaramakrishnan, Cupertino, CA (US);
Bok Hoen Kim, San Jose, CA (US);
Hichem M'Saad, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for depositing an amorphous carbon layer on a substrate includes the steps of positioning a substrate in a chamber, introducing a hydrocarbon source into the processing chamber, introducing a heavy noble gas into the processing chamber, and generating a plasma in the processing chamber. The heavy noble gas is selected from the group consisting of argon, krypton, xenon, and combinations thereof and the molar flow rate of the noble gas is greater than the molar flow rate of the hydrocarbon source. A post-deposition termination step may be included, wherein the flow of the hydrocarbon source and the noble gas is stopped and a plasma is maintained in the chamber for a period of time to remove particles therefrom.