The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 09, 2010

Filed:

Jul. 22, 2008
Applicants:

Mamoru Nakasuji, Kanagawa, JP;

Nobuharu Noji, Kanagawa, JP;

Tohru Satake, Kanagawa, JP;

Toshifumi Kimba, Kanagawa, JP;

Hirosi Sobukawa, Kanagawa, JP;

Tsutomu Karimata, Kanagawa, JP;

Shin Oowada, Kanagawa, JP;

Shoji Yoshikawa, Tokyo, JP;

Mutsumi Saito, Kanagawa, JP;

Inventors:

Mamoru Nakasuji, Kanagawa, JP;

Nobuharu Noji, Kanagawa, JP;

Tohru Satake, Kanagawa, JP;

Toshifumi Kimba, Kanagawa, JP;

Hirosi Sobukawa, Kanagawa, JP;

Tsutomu Karimata, Kanagawa, JP;

Shin Oowada, Kanagawa, JP;

Shoji Yoshikawa, Tokyo, JP;

Mutsumi Saito, Kanagawa, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 40/14 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating meansfor irradiating an electron beam having a particular width, a primary electron-optical systemfor leading the beam to reach the surface of a substrateunder testing, a secondary electron-optical systemfor trapping secondary electrons generated from the substrateand introducing them into an image processing system, a stagefor transportably holding the substratewith a continuous degree of freedom equal to at least one, a testing chamber for the substrate, a substrate transport mechanism for transporting the substrateinto and out of the testing chamber, an image processing analyzerfor detecting defects on the substrate, a vibration isolating mechanism for the testing chamber, a vacuum system for holding the testing chamber at a vacuum, and a control systemfor displaying or storing positions of defects on the substrate


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