The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Apr. 10, 2007
Alexander N. Bykanov, San Diego, CA (US);
Norbert Bowering, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Alexander N. Bykanov, San Diego, CA (US);
Norbert Bowering, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David C. Brandt, Escondido, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Oleh Khodykin, San Diego, CA (US);
William N. Partlo, Poway, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.