The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 2010
Filed:
Jan. 31, 2005
Zain K. Saidin, San Mateo, CA (US);
Yalin Xiong, Union City, CA (US);
Lance Glasser, Saratoga, CA (US);
Carl Hess, Los Altos, CA (US);
Moshe E. Preil, Sunnyvale, CA (US);
Zain K. Saidin, San Mateo, CA (US);
Yalin Xiong, Union City, CA (US);
Lance Glasser, Saratoga, CA (US);
Carl Hess, Los Altos, CA (US);
Moshe E. Preil, Sunnyvale, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.