The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2009
Filed:
Dec. 06, 2007
Tetsuji Togawa, Tokyo, JP;
Osamu Nabeya, Tokyo, JP;
Makoto Fukushima, Tokyo, JP;
Kunihiko Sakurai, Tokyo, JP;
Hiroshi Yoshida, Tokyo, JP;
Teruhiko Ichimura, Tokyo, JP;
Tetsuji Togawa, Tokyo, JP;
Osamu Nabeya, Tokyo, JP;
Makoto Fukushima, Tokyo, JP;
Kunihiko Sakurai, Tokyo, JP;
Hiroshi Yoshida, Tokyo, JP;
Teruhiko Ichimura, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus according to the present invention comprises a top ring body having a receiving space therein, and a vertically movable member which is vertically movable within the receiving space in the top ring body. An abutment member having an elastic membrane is attached to a lower surface of the vertically movable member. The elastic membrane of the abutment member comprises an abutment portion, having a flange projecting outwardly, brought into direct or indirect contact with the substrate, and a connecting portion extending upwardly from a base portion of the flange of the abutment portion and being connected to the vertically movable member. The connecting portion is made of a material having a flexibility higher than that of material of the abutment portion.