The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Jun. 25, 2004
Kenji Watanabe, Oume, JP;
Tadashi Otaka, Hitachinaka, JP;
Ryo Nakagaki, Kawasaki, JP;
Chie Shishido, Yokohama, JP;
Masakazu Takahashi, Tsuchiura, JP;
Yuya Toyoshima, Sendai, JP;
Kenji Watanabe, Oume, JP;
Tadashi Otaka, Hitachinaka, JP;
Ryo Nakagaki, Kawasaki, JP;
Chie Shishido, Yokohama, JP;
Masakazu Takahashi, Tsuchiura, JP;
Yuya Toyoshima, Sendai, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A method and apparatus for efficiently executing two types of measurements with an optical measuring device and a scanning electron microscope are provided. For example, the method and apparatus may execute the following steps: calculating an average of the dimensional values of a plurality of scanned feature objects; and calculating an offset of a dimensional value on the basis of a difference between the calculated average value and the dimensional value of the feature object obtained when the light is irradiated. The offset between measurement values between the optical measuring device and the scanning electron microscope can be determined precisely.