The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2008
Filed:
Dec. 20, 2004
Karl-stefan Weissenrieder, Aalen, DE;
Alexander Hirnet, Ellwangen, DE;
Alexandra Pazidis, Aalen, DE;
Karl-heinz Schuster, Koenigsbronn, DE;
Christoph Zaczek, Heubach, DE;
Michael Lill, Aalen, DE;
Guenter Scheible, Legal Representative, Stuttgart, DE;
Harald Schink, Aalen, DE;
Markus Brotsack, Aalen, DE;
Ulrich Loering, Oberkochen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Karl-Stefan Weissenrieder, Aalen, DE;
Alexander Hirnet, Ellwangen, DE;
Alexandra Pazidis, Aalen, DE;
Karl-Heinz Schuster, Koenigsbronn, DE;
Christoph Zaczek, Heubach, DE;
Michael Lill, Aalen, DE;
Guenter Scheible, legal representative, Stuttgart, DE;
Harald Schink, Aalen, DE;
Markus Brotsack, Aalen, DE;
Ulrich Loering, Oberkochen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.