The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 04, 2008
Filed:
Jul. 22, 2004
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Antonius Johannes Van Der Net, Tilburg, NL;
Yuri Johannes Gabriel Van DE Vijver, Best, NL;
Bernard Gellrich, Aalen, DE;
Bauke Jansen, Deurne, NL;
Rens Sanderse, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Antonius Johannes Van Der Net, Tilburg, NL;
Yuri Johannes Gabriel Van De Vijver, Best, NL;
Bernard Gellrich, Aalen, DE;
Bauke Jansen, Deurne, NL;
Rens Sanderse, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.