The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 2008
Filed:
Jul. 08, 2005
Takashi Hiroi, Yokohama, JP;
Asahiro Kuni, Tokyo, JP;
Masahiro Watanabe, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Hiroyuki Shinada, Cyofu, JP;
Yasuhiro Gunji, Hitachiohta, JP;
Atsuko Takafuji, Tokyo, JP;
Takashi Hiroi, Yokohama, JP;
Asahiro Kuni, Tokyo, JP;
Masahiro Watanabe, Yokohama, JP;
Chie Shishido, Yokohama, JP;
Hiroyuki Shinada, Cyofu, JP;
Yasuhiro Gunji, Hitachiohta, JP;
Atsuko Takafuji, Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A pattern inspection method and apparatus in which a charged particle beam is irradiated onto a surface of a specimen on which a pattern is formed, plural sensors simultaneously detect secondary particles emanated from the surface of the specimen by the irradiation, signals outputted from each sensor of the plural sensors which simultaneously detect the secondary particles are added, an image of the surface of the specimen on which the pattern is obtained from the added signals, and the image is processed to detect a defect of the pattern.