The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2008
Filed:
Feb. 17, 2006
Yoshinori Nakayama, Sayama, JP;
Hiroya Ohta, Kodaira, JP;
Makoto Sakakibara, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Masaki Hosoda, Saitama, JP;
Yoshinori Nakayama, Sayama, JP;
Hiroya Ohta, Kodaira, JP;
Makoto Sakakibara, Kokubunji, JP;
Yasunari Sohda, Kawasaki, JP;
Masaki Hosoda, Saitama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An electron beam writing technology which enables highly accurate deflection correction of a minute field used in an electron beam writing system is provided. In this system, a function to move an electron beam by a deflection means through high-speed deflection scanning so as to repeat formation of a cyclic patterned electron beam and a function to move the patterned electron beam on cyclic correction marks by the deflection means through low-speed deflection scanning in synchronization with one cycle of the repetition are provided, and reflected electrons or secondary electrons emitted from the correction marks and the vicinity thereof or transmitted electrons transmitted through the correction marks in the low-speed deflection scanning are detected so as to correct the position or deflection amount of the electron beam based on the detection result.