The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2008
Filed:
Mar. 31, 2005
Jang-shiang Tsai, Shindian, TW;
Peng-fu Hsu, Hsinchu, TW;
Baw-ching Perng, Hsin-Chu, TW;
Ju-wang Hsu, Taipei, TW;
Jyu-horng Shieh, Hsin-Chu, TW;
Yi-nien Su, Kaohsiung, TW;
Hun-jan Tao, HsinChu, TW;
Jang-Shiang Tsai, Shindian, TW;
Peng-Fu Hsu, Hsinchu, TW;
Baw-Ching Perng, Hsin-Chu, TW;
Ju-Wang Hsu, Taipei, TW;
Jyu-Horng Shieh, Hsin-Chu, TW;
Yi-Nien Su, Kaohsiung, TW;
Hun-Jan Tao, HsinChu, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method and system for determining the dielectric constant of a low-k dielectric film on a production substrate include measuring the electronic component of the dielectric constant using an ellipsometer, measuring the ionic component of the dielectric constant using an IR spectrometer, measuring the overall dielectric constant using a microwave spectrometer and deriving the dipolar component of the dielectric constant. The measurements and determination are non-contact and may be carried out on a production device that is further processed following the measurements.