The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2008
Filed:
Sep. 14, 2004
Fujio Masuoka, Miyagi, Sendai-shi, JP;
Hiroshi Sakuraba, Sendai, JP;
Fumiyoshi Matsuoka, Sendai, JP;
Syounosuke Ueno, Fujiidera, JP;
Ryusuke Matsuyama, Nara, JP;
Shinji Horii, Fukuyama, JP;
Takuji Tanigami, Fukuyama, JP;
Fujio Masuoka, Miyagi, Sendai-shi, JP;
Hiroshi Sakuraba, Sendai, JP;
Fumiyoshi Matsuoka, Sendai, JP;
Syounosuke Ueno, Fujiidera, JP;
Ryusuke Matsuyama, Nara, JP;
Shinji Horii, Fukuyama, JP;
Takuji Tanigami, Fukuyama, JP;
Other;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A memory cell unit including: a semiconductor substrate having a source diffusion layer in at least a part of a surface thereof; a column-shaped semiconductor layer provided on the semiconductor substrate, and having a drain diffusion layer provided in an uppermost portion thereof and a first low concentration impurity diffusion layer provided in an entire bottom portion thereof; a memory cell arrangement which includes a plurality of memory cells provided in a peripheral wall of the column-shaped semiconductor layer and connected in series perpendicularly to the substrate, the memory cells each having a charge storage layer and a control gate; a second impurity diffusion layer provided at a lower end of the memory cell arrangement; and a selection transistor having a gate electrode provided around the peripheral wall of the column-shaped semiconductor layer and connecting the second impurity diffusion layer and the first impurity diffusion layer; wherein the first impurity diffusion layer extends into a part of a channel region provided in the peripheral wall of the column-shaped semiconductor layer in opposed relation to the gate electrode of the selection transistor.