The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 29, 2008
Filed:
Mar. 20, 2006
Nobuharu Noji, Zushi, JP;
Tohru Satake, Chigasaki, JP;
Hirosi Sobukawa, Zama, JP;
Toshifumi Kimba, Fujisawa, JP;
Masahiro Hatakeyama, Fujisawa, JP;
Shoji Yoshikawa, Hachioji, JP;
Takeshi Murakami, Shinagawa-ku, JP;
Kenji Watanabe, Fujisawa, JP;
Tsutomu Karimata, Yokohama, JP;
Kenichi Suematsu, Yokohama, JP;
Yutaka Tabe, Yokohama, JP;
Ryo Tajima, Yokohama, JP;
Keiichi Tohyama, Yokohama, JP;
Nobuharu Noji, Zushi, JP;
Tohru Satake, Chigasaki, JP;
Hirosi Sobukawa, Zama, JP;
Toshifumi Kimba, Fujisawa, JP;
Masahiro Hatakeyama, Fujisawa, JP;
Shoji Yoshikawa, Hachioji, JP;
Takeshi Murakami, Shinagawa-ku, JP;
Kenji Watanabe, Fujisawa, JP;
Tsutomu Karimata, Yokohama, JP;
Kenichi Suematsu, Yokohama, JP;
Yutaka Tabe, Yokohama, JP;
Ryo Tajima, Yokohama, JP;
Keiichi Tohyama, Yokohama, JP;
Ebara Corporation, Tokyo, JP;
Abstract
A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source, then forms an image under a desired magnification in the direction of a sample W to produce a crossover. When the crossover is passed, electrons as noises are removed from the crossover with an aperture, an adjustment is made so that the crossover becomes a parallel electron beam to irradiate the substrate in a desired sectional form. The electron beam is produced such that the unevenness of illuminance is 10% or less. Electrons emitted from the sample W are detected by a detector