The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Dec. 22, 2004
James T. Mcwhirter, San Jose, CA (US);
Liang-guo Wang, Fremont, CA (US);
Hidong Kwak, San Jose, CA (US);
Haixing Zou, Sunnyvale, CA (US);
Dan Georgesco, San Jose, CA (US);
Bernard Lautee, San Jose, CA (US);
Jennming James Chen, Campbell, CA (US);
Gary R. Janik, Palo Alto, CA (US);
Patrick M. Maxton, San Jose, CA (US);
James T. McWhirter, San Jose, CA (US);
Liang-Guo Wang, Fremont, CA (US);
Hidong Kwak, San Jose, CA (US);
Haixing Zou, Sunnyvale, CA (US);
Dan Georgesco, San Jose, CA (US);
Bernard Lautee, San Jose, CA (US);
Jennming James Chen, Campbell, CA (US);
Gary R. Janik, Palo Alto, CA (US);
Patrick M. Maxton, San Jose, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Methods and systems for preparing a sample for thin film analysis are provided. One system includes an energy beam source configured to generate an energy beam. The system also includes an energy beam delivery subsystem configured to direct the energy beam to a sample and to modify the energy beam such that the energy beam has a substantially flat-top profile on the sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample. One method includes generating an energy beam and modifying the energy beam such that the energy beam has a substantially flat-top profile. The method also includes directing the energy beam to a sample. The energy beam removes a portion of a contaminant layer on the sample to expose an analysis area of a thin film on the sample.