The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2006
Filed:
Jul. 04, 2003
Y. Y. Chang, Hsinchu, TW;
Shih-liang Chou, Hsinchu, TW;
L. H. Lee, Hsinchu, TW;
Tsung-de Lin, Hsinchu, TW;
Kou-yow Tseng, Hsinchu, TW;
Wen-cheng Lien, Hsinchu, TW;
Y. Y. Chang, Hsinchu, TW;
Shih-Liang Chou, Hsinchu, TW;
L. H. Lee, Hsinchu, TW;
Tsung-De Lin, Hsinchu, TW;
Kou-Yow Tseng, Hsinchu, TW;
Wen-Cheng Lien, Hsinchu, TW;
Macronix International Co., Ltd., Hsinchu, TW;
Abstract
A rapid thermal annealing ('RTA') process providing for an RTA equipment is disclosed. The RTA equipment has a pyrometer providing for measuring an operation parameter, e.g., a temperature of the RTA process. The RTA process comprises steps of proceeding a first RTA step to a wafer in the RTA equipment, then comparing a measured value of the operation parameter with a reference range of value of the operation parameter, thereafter proceeding a second RTA step to the wafer in the RTA equipment when the measured value of the operation parameter is in between the reference range of value of the operation parameter. When the measured value of the operation parameter is out of the reference range of value of the operation parameter, the RTA equipment is turned off, and the wafer is unloaded from the RTA equipment and loaded into another RTA equipment to complete the RTA process.