The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2006
Filed:
Nov. 03, 2003
Grant M. Kloster, Lake Oswego, OR (US);
Kevin P. O'brien, Portland, OR (US);
Michael D. Goodner, Hillsboro, OR (US);
Jihperng Leu, Portland, OR (US);
David H. Gracias, Portland, OR (US);
Lee D. Rockford, Portland, OR (US);
Peter K. Moon, Portland, OR (US);
Chris E. Barns, Portland, OR (US);
Grant M. Kloster, Lake Oswego, OR (US);
Kevin P. O'brien, Portland, OR (US);
Michael D. Goodner, Hillsboro, OR (US);
Jihperng Leu, Portland, OR (US);
David H. Gracias, Portland, OR (US);
Lee D. Rockford, Portland, OR (US);
Peter K. Moon, Portland, OR (US);
Chris E. Barns, Portland, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
An inter-layer dielectric structure and method of making such structure are disclosed. A composite dielectric layer, initially comprising a porous matrix and a porogen, is formed. Subsequent to other processing treatments, the porogen is decomposed and removed from at least a portion of the porous matrix, leaving voids defined by the porous matrix in areas previously occupied by the porogen. The resultant structure has a desirably low k value as a result of the porosity and materials comprising the porous matrix and porogen. The composite dielectric layer may be used in concert with other dielectric layers of varying porosity, dimensions, and material properties to provide varied mechanical and electrical performance profiles.