The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 21, 2006
Filed:
Mar. 24, 2004
Amir Azordegan, Santa Clara, CA (US);
Gian Francesco Lorusso, Fremont, CA (US);
Ananthanarayanan Mohan, Santa Clara, CA (US);
Mark Neil, San Jose, CA (US);
Waiman NG, Los Gatos, CA (US);
Srini Vedula, San Jose, CA (US);
Amir Azordegan, Santa Clara, CA (US);
Gian Francesco Lorusso, Fremont, CA (US);
Ananthanarayanan Mohan, Santa Clara, CA (US);
Mark Neil, San Jose, CA (US);
Waiman Ng, Los Gatos, CA (US);
Srini Vedula, San Jose, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
A method of improving stability for CD-SEM measurements of photoresist, in particular 193 nm photoresist, and of reducing shrinkage of 193 nm photoresist during CD-SEM measurements. The photoresist is exposed to a dose of electrons or other stabilizing beam prior to or during CD measurement. One embodiment of the invention includes multiplexing of the SEM electron beam.