Company Filing History:
Years Active: 2006
Title: The Innovative Mind of Srini Vedula
Introduction
Srini Vedula, an accomplished inventor based in San Jose, California, has made notable contributions to the field of semiconductor manufacturing. He holds a patent that enhances the accuracy and reliability of Critical Dimension Scanning Electron Microscopy (CD-SEM) measurements, crucial for the production of integrated circuits.
Latest Patents
Vedula's patent, titled "Methods of Stabilizing Measurement of ArF Resist in CD-SEM," focuses on improving the stability of measurements for 193 nm photoresist. This invention reduces shrinkage during CD-SEM measurements by exposing photoresist to a dose of electrons or a stabilizing beam. One innovative aspect of this method includes the multiplexing of the SEM electron beam, which aids in achieving precise and consistent measurements.
Career Highlights
Srini Vedula currently works at KLA Corporation, a leading company in advanced semiconductor manufacturing equipment. His expertise in the unique challenges of photoresist measurement contributes significantly to KLA's innovative solutions in the semiconductor industry.
Collaborations
Throughout his career, Vedula has collaborated with prominent professionals such as Amir Azordegan and Gian Francesco Lorusso. These partnerships have not only enriched his work experience but have also fostered a culture of innovation and excellence within the teams he has been part of.
Conclusion
With his groundbreaking patent and collaboration with top industry professionals, Srini Vedula exemplifies the spirit of innovation in semiconductor technology. His contributions are vital in paving the way for advancements in the manufacturing processes that are fundamental to our modern technological landscape.