The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Mar. 15, 2002
Same-ting Chen, Hsinchu, TW;
Cheng-shien Lee, Hsinchu, TW;
Chin-wang HU, Jubei, TW;
Chieh-yuan Cheng, Taipei, TW;
Hsiang-chien Hsu, Taipei, TW;
Tzy-ying Lin, Hsinchu, TW;
Wen-rong Huang, Hsinchu, TW;
Same-Ting Chen, Hsinchu, TW;
Cheng-Shien Lee, Hsinchu, TW;
Chin-Wang Hu, Jubei, TW;
Chieh-Yuan Cheng, Taipei, TW;
Hsiang-Chien Hsu, Taipei, TW;
Tzy-Ying Lin, Hsinchu, TW;
Wen-Rong Huang, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A new sequence and chemical composition for cleaning the surface of a halftone shift masks that use MoSiON as shifter material is provided. For purposes of repair or rework, the pellicle is removed from the mask so that the mask can be accessed. After the rework or repair has been completed, a new clean process is performed, for the new clean process the sequence of steps that is conventionally performed has been modified. After the new clean process has been completed, the pellicle is reinstalled over the surface of the mask.