This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Hsiang-Chien Hsu: Innovator in Cleaning Processes for Phase Shift Masks
Introduction
Hsiang-Chien Hsu is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the cleaning processes for phase shift masks. His innovative approach has led to the development of a unique cleaning method that enhances the efficiency and effectiveness of mask maintenance.
Latest Patents
Hsu holds a patent for a cleaning process specifically designed for phase shift masks. This patent introduces a new sequence and chemical composition for cleaning the surface of halftone shift masks that utilize MoSiON as the shifter material. The process involves removing the pellicle from the mask to allow for repair or rework. After completing the necessary repairs, a modified cleaning sequence is performed before reinstalling the pellicle over the mask's surface.
Career Highlights
Hsiang-Chien Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in semiconductor technology. His work has been instrumental in advancing cleaning techniques that are crucial for maintaining the integrity of phase shift masks used in high-precision manufacturing processes.
Collaborations
Hsu collaborates with esteemed colleagues, including Same-Ting Chen and Cheng-Shien Lee. Their combined efforts contribute to the ongoing innovation and improvement of semiconductor manufacturing processes.
Conclusion
Hsiang-Chien Hsu's contributions to the field of semiconductor manufacturing, particularly through his patented cleaning process for phase shift masks, highlight his role as a key innovator. His work not only enhances the efficiency of mask maintenance but also supports the broader advancements in semiconductor technology.