This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Innovations by Chin-Wang Hu in Semiconductor Cleaning Processes
Introduction
Chin-Wang Hu is a notable inventor based in Jubei, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the cleaning processes of phase shift masks. His innovative approach has led to the development of a unique cleaning method that enhances the efficiency and effectiveness of mask maintenance.
Latest Patents
Chin-Wang Hu holds a patent for a "Cleaning process for phase shift masks." This patent introduces a new sequence and chemical composition for cleaning the surface of halftone shift masks that utilize MoSiON as the shifter material. The process involves removing the pellicle from the mask to allow for repair or rework. After completing the necessary repairs, a modified cleaning sequence is performed before reinstalling the pellicle over the mask's surface.
Career Highlights
Chin-Wang Hu is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His work has been instrumental in improving cleaning processes, which are critical for maintaining the quality and performance of semiconductor devices.
Collaborations
Chin-Wang Hu has collaborated with esteemed colleagues, including Same-Ting Chen and Cheng-Shien Lee. Their combined expertise has contributed to advancements in semiconductor technology and cleaning methodologies.
Conclusion
Chin-Wang Hu's innovative cleaning process for phase shift masks represents a significant advancement in semiconductor manufacturing. His contributions continue to influence the industry, ensuring the reliability and efficiency of semiconductor devices.