This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: Innovations by Cheng-Shien Lee
Introduction
Cheng-Shien Lee is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the cleaning processes of phase shift masks. His innovative approach has led to the development of a unique cleaning method that enhances the efficiency and effectiveness of mask maintenance.
Latest Patents
Cheng-Shien Lee holds a patent for a "Cleaning process for phase shift masks." This patent introduces a new sequence and chemical composition for cleaning the surface of halftone shift masks that utilize MoSiON as the shifter material. The process involves removing the pellicle from the mask for repair or rework, followed by a modified cleaning sequence. After completing the new cleaning process, the pellicle is reinstalled over the mask's surface, ensuring optimal functionality.
Career Highlights
Cheng-Shien Lee is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing cleaning techniques that are crucial for maintaining the integrity of phase shift masks used in various applications.
Collaborations
Cheng-Shien Lee has collaborated with esteemed colleagues, including Same-Ting Chen and Chin-Wang Hu. Their combined expertise has contributed to the successful development and implementation of innovative cleaning processes in semiconductor manufacturing.
Conclusion
Cheng-Shien Lee's contributions to the field of semiconductor manufacturing through his innovative cleaning processes for phase shift masks highlight his role as a significant inventor. His work not only improves the efficiency of mask maintenance but also sets a precedent for future innovations in the industry.