This inventor holds 5 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2003-2006.
Company Filing History:
Years Active: 2003-2006
Title: Same-Ting Chen: Innovator in Photomask Repair Technologies
Introduction
Same-Ting Chen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photomask repair technologies, holding a total of five patents. His innovative approaches have advanced the capabilities of photolithographic processes, which are crucial in semiconductor manufacturing.
Latest Patents
Chen's latest patents include a "Quartz damage repair method for high-end mask," which provides a technique for repairing photolithographic exposure masks. This method utilizes focused ion-beam exposure to intentionally damage the surface of the exposure mask in areas where opaque or light-blocking material is needed. Another notable patent is the "Chelation cleaning process for repairing photomasks," which describes a method for removing residual defects in photomasks through gallium chelation with a water-soluble amine polymer.
Career Highlights
Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the reliability and performance of photomasks used in high-end semiconductor fabrication.
Collaborations
Some of his notable coworkers include Tzy-Ying Lin and Wen-Rong Huang, who have collaborated with him on various projects related to photomask technologies.
Conclusion
Same-Ting Chen's contributions to photomask repair technologies have positioned him as a key figure in the semiconductor industry. His innovative patents reflect his commitment to advancing technology in this critical field.