The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 11, 2002
Filed:
Mar. 27, 2000
Applicant:
Inventors:
Steven T. Mayer, Lake Oswego, OR (US);
Richard Hill, San Jose, CA (US);
Alain Harrus, Palo Alto, CA (US);
Evan Patton, Portland, OR (US);
Robert Contolini, Lake Oswego, OR (US);
Steve Taatjes, West Linn, OR (US);
Jon Reid, Sherwood, OR (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D 5/00 ;
U.S. Cl.
CPC ...
C25D 5/00 ;
Abstract
An electrochemical reactor is used to electrofill damascene architecture for integrated circuits. A shield is used to screen the applied field during electroplating operations to compensate for potential drop along the radius of a wafer. The shield establishes an inverse potential drop in the electrolytic fluid to overcome the resistance of a thin film seed layer of copper on the wafer.