Company Filing History:
1 out of 3,768 
1 out of 832,680 Years Active: 1998-2002
Title: The Innovative Contributions of Alain Harrus
Introduction
Alain Harrus is a notable inventor based in Palo Alto, CA, recognized for his significant contributions to the field of integrated circuit technology. With a total of 2 patents, he has made strides in enhancing the efficiency and effectiveness of electroplating processes in semiconductor manufacturing.
Latest Patents
Harrus's latest patents include a method and apparatus for uniform electroplating of integrated circuits using a variable field shaping element. This innovation involves an electrochemical reactor designed to electrofill damascene architecture for integrated circuits. A shield is utilized to screen the applied field during electroplating operations, compensating for potential drop along the radius of a wafer. The shield establishes an inverse potential drop in the electrolytic fluid, overcoming the resistance of a thin film seed layer of copper on the wafer. Another significant patent is for a chuck for substrate processing and a method for depositing a film in a radio frequency biased plasma chemical deposition system. This chuck features a dielectric layer with a substrate receiving surface that is at least as large as the substrate being processed. Additionally, it includes an electrode buried in the chuck body, which is larger than the substrate receiving surface, ensuring that the edges of a radio frequency field generated by the electrode extend beyond the substrate receiving surface.
Career Highlights
Throughout his career, Alain Harrus has worked with prominent companies, including Lam Research Corporation. His work has focused on advancing technologies that improve the manufacturing processes of semiconductors, making him a valuable asset in the industry.
Collaborations
Harrus has collaborated with notable professionals in the field, including Steven T. Mayer and Richard N. Hill. These collaborations have contributed to the development of innovative solutions in semiconductor technology.
Conclusion
Alain Harrus's contributions to the field of integrated circuits through his patents and collaborations highlight his role as a key innovator in semiconductor technology. His work continues to influence advancements in the industry, showcasing the importance of innovation in driving progress.
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