The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2002
Filed:
May. 04, 2001
Chie Shishido, Yokohama, JP;
Takashi Hiroi, Yokohama, JP;
Haruo Yoda, Nishitama-gun, JP;
Masahiro Watanabe, Yokohama, JP;
Asahiro Kuni, Setagaya-ku, JP;
Maki Tanaka, Yokohama, JP;
Takanori Ninomiya, Hiratsuka, JP;
Hideaki Doi, Oota-ku, JP;
Shunji Maeda, Yokohama, JP;
Mari Nozoe, Oume, JP;
Hiroyuki Shinoda, Choufu, JP;
Atsuko Takafuji, Nerima-ku, JP;
Aritoshi Sugimoto, Bunkyou-ku, JP;
Yasutsugu Usami, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method for inspecting a pattern formed on a substrate, includes the steps of moving a table along a first direction on which a substrate to be inspected is mounted, irradiating a converged electron beam on the substrate by scanning the converged electron beam along a second direction which is perpendicular to the first direction; detecting an electron radiated from the substrate by the irradiation of the converged electron beam in which the movement of the table and the scanning of the converged electron beam are synchronized; forming a digital image of the substrate from the detected electron; improving a quality of the digital image by filtering the digital image; and detecting a defect of a pattern formed on the substrate by using the improved quality digital image.