The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Mar. 17, 1999
Koji Harada, Kikuchi-gun, JP;
Junichi Nagata, Kumamoto, JP;
Yasunori Kawakami, Kikuchi, JP;
Masatoshi Kaneda, Kikuchi-gun, JP;
Norio Semba, Kikuchi-gun, JP;
Yoshio Kimura, Kikuchi-gun, JP;
Masami Akimoto, Kumamoto, JP;
Yasuhiro Sakamoto, Kamoto-gun, JP;
Nobuyuki Jinnai, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A gas supplied from a gas source is exposed to an atmosphere above a liquid surface in a tank saving the liquid and thereafter is supplied around a wafer in a treatment chamber through a gas supply passage and a supply port. The gas supplied around the wafer uniformly flows from around the wafer toward above the center of the wafer and thereafter is discharged from an exhaust port which is formed at the top of the treatment chamber. Meanwhile, with respect to the wafer, heat treatment is performed by a heating mechanism and a predetermined PEB is carried out. The humidified gas is supplied into the treatment chamber, thereby preventing drying in the treatment chamber. Therefore, water in resist is not taken out, resulting in that a required resist pattern can be formed on the wafer.