The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 19, 2002

Filed:

Jun. 16, 2000
Applicant:
Inventors:

Szu-Wei Lu, Hsin Chu, TW;

Kuo-Chuan Chen, Hsinchu, TW;

Jyh-Rong Lin, Taipei, TW;

Ruoh-Huey Wang, Taipei, TW;

Hsu-Tien Hu, Hsinchu, TW;

Hsin-Chien Huang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract

A method for forming a wafer level package by incorporating an insulating pad of an elastic material under a dummy plug is described. In the method, a multiplicity of pads or islands formed of an elastic material is first formed on a pre-processed semiconductor substrate before a multiplicity of dummy via plugs are formed on top. The dummy via plugs are used as a support structure for building I/O redistribution lines (i.e. metal traces) thereon such that I/O bond pads may be built for supporting solder bumps or solder balls. The multiplicity of insulating pads is used for stress relief during a bonding process with the solder ball built on top without the conventional defect of cracking due to high elasticity of the material when a large area insulating layer is deposited on top. Numerous processing advantages are provided by the present invention method which includes the elimination of direct contact between an elastomeric material layer and a polyimide passivation layer such that potential cracking of the polyamide layer or breaking of I/O redistribution lines can be avoided.


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