The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
Jul. 06, 2000
Chie Shishido, Yokohama, JP;
Takashi Hiroi, Yokohama, JP;
Haruo Yoda, Nishitama-gun, JP;
Masahiro Watanabe, Yokohama, JP;
Asahiro Kuni, Setagaya-ku, JP;
Maki Tanaka, Yokohama, JP;
Takanori Ninomiya, Hiratsuka, JP;
Hideaki Doi, Oota-ku, JP;
Shunji Maeda, Yokohama, JP;
Mari Nozoe, Oume, JP;
Hiroyuki Shinoda, Choufu, JP;
Atsuko Takafuji, Nerima-ku, JP;
Aritoshi Sugimoto, Bunkyou-ku, JP;
Yasutsugu Usami, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method and apparatus for inspecting a pattern, a first image of a first area on a sample is acquired by imaging the first area formed as a first pattern, and the first image is memorized. A second image of a second area on the sample is acquired by imaging the second area formed as a second pattern which is to be the same as the first pattern. A defect of the first pattern is detected by acquiring a differential image between the first image and the second image. The detection of the defect includes processing the differential image by using information of brightness corresponding to both of the first image and the second image.