The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 1999
Filed:
Jun. 25, 1998
Kenneth Collins, San Jose, CA (US);
Michael Rice, Pleasanton, CA (US);
David Groechel, Sunnyvale, CA (US);
Gerald Yin, Cupertino, CA (US);
Jon Mohn, Saratoga, CA (US);
Craig Roderick, San Jose, CA (US);
Douglas Buchberger, Tracy, CA (US);
Chan-Lon Yang, Los Gatos, CA (US);
Jerry Wong, Fremont, CA (US);
Jeffrey Marks, San Jose, CA (US);
Peter Keswick, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A general method of the invention is to provide a polymer-hardening precursor piece (such as silicon, carbon, silicon carbide or silicon nitride, but preferably silicon) within the reactor chamber during an etch process with a fluoro-carbon or fluoro-hydrocarbon gas, and to heat the polymer-hardening precursor piece above the polymerization temperature sufficiently to achieve a desired increase in oxide-to-silicon etch selectivity. Generally, this polymer-hardening precursor or silicon piece may be an integral part of the reactor chamber walls and/or ceiling or a separate, expendable and quickly removable piece, and the heating/cooling apparatus may be of any suitable type including apparatus which conductively or remotely heats the silicon piece.