The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 17, 1998
Filed:
Apr. 04, 1995
Applicant:
Inventors:
Kiyohisa Tateyama, Kumamoto, JP;
Kimio Motoda, Kumamoto, JP;
Tatsuya Iwasaki, Kumamoto, JP;
Takenobu Matsuo, Kofu, JP;
Kazuki Denpoh, Nirasaki, JP;
Eiji Yamaguchi, Yamanashi-ken, JP;
Assignees:
Tokyo Electron Limited, Tokyo, JP;
Tokyo Electron Kyushu Limited, Tosu, JP;
Primary Examiner:
Int. Cl.
CPC ...
D05C / ;
U.S. Cl.
CPC ...
118 52 ; 118 56 ; 118 66 ; 118319 ; 118321 ; 118323 ; 134144 ; 134902 ;
Abstract
A apparatus of resist-processing a rectangular substrate including a resist coating step of supplying resist solution to the substrate, while rotating it, to form resist film at least on one surface of it and a resist removing step of jetting removing liquid, which can solve resist, to both surfaces of it at its side peripheral portions to remove the resist film from them.