The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 1997

Filed:

Mar. 25, 1994
Applicant:
Inventors:

Keizo Hasebe, Kofu, JP;

Akihiro Fujimoto, Kumamoto-ken, JP;

Hiroichi Inada, Kumamoto, JP;

Hiroyuki Iino, Nirasaki, JP;

Shinzi Kitamura, Kumamoto-ken, JP;

Masatoshi Deguchi, Kumamoto, JP;

Mitsuhiro Nambu, Kumamoto-ken, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427240 ; 427299 ; 4273855 ; 438782 ;
Abstract

An apparatus for forming a coating film, comprises a spin chuck for supporting a substrate with one surface facing upward and rotating the substrate about a vertical axis, a first nozzle for supplying a solvent of a coating solution on the substrate, and a second nozzle for supplying the coating solution on a central portion of the substrate. The first and second nozzles are supported by a head such that the supported nozzle moves between a dropping position above the substrate and a waiting position offset from the substrate. The solvent and coating solution are diffused along the surface of the substrate by rotating the spin chuck.


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