The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2026
Filed:
Oct. 12, 2021
Asml Netherlands B.v., Veldhoven, NL;
Peter Michael Kraus, Amsterdam, NL;
Sylvianne Dorothea Christina Roscam Abbing, Utrecht, NL;
Filippo Campi, Amsterdam, NL;
Zhuangyan Zhang, Berlin, DE;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Nan Lin, Eindhoven, NL;
Stefan Michiel Witte, Hoofddorp, NL;
Arie Jeffrey Den Boef, Waalre, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.