Company Filing History:
Years Active: 2025
Title: Filippo Campi: Innovator in Metrology Technology
Introduction
Filippo Campi is an accomplished inventor based in Amsterdam, Netherlands, known for his contribution to metrology technology. With a strong focus on advancing measurement capabilities, he has made a significant impact in the field of lithographic processes.
Latest Patents
Filippo Campi holds a patent for a metrology apparatus based on high harmonic generation and associated method. This innovative device is designed to measure targets formed on substrates through lithographic processes. The apparatus features a radiation source that provides first radiation, a configured solid high harmonic generation medium that generates high harmonic second radiation, and a detection arrangement that can detect the second radiation, some of which has been scattered by the target. This technology enhances precision in measurements crucial for various applications in nanotechnology.
Career Highlights
Currently, Filippo Campi is associated with ASML Netherlands B.V., a leading company in semiconductor technology. His work at ASML highlights his dedication to pushing the boundaries of metrology and developing cutting-edge technologies that support the industry's growth.
Collaborations
Throughout his career, Filippo has collaborated with several talented professionals, including Peter Michael Kraus and Sylvianne Dorothea Christina Roscam Abbing. These collaborations exemplify the teamwork and innovation that drive advancements in metrology and related fields.
Conclusion
Filippo Campi's innovative spirit and dedication to enhancing measurement technologies make him a noteworthy figure in the realm of patents and inventions. His work not only reflects a commitment to excellence but also contributes significantly to the advancement of the semiconductor industry and metrology methods.