Amsterdam, Netherlands

Peter Michael Kraus

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Peter Michael Kraus – Innovator in Metrology Technology

Introduction

Peter Michael Kraus is a notable inventor based in Amsterdam, Netherlands. He has made significant contributions to the field of metrology with a focus on advanced measurement techniques for lithographic processes. His innovative work has played a critical role in enhancing the precision and effectiveness of semiconductor manufacturing.

Latest Patents

Peter is credited with one patent titled "Metrology apparatus based on high harmonic generation and associated method." This groundbreaking invention provides a detailed solution for measuring targets formed on substrates during lithographic processes. The apparatus comprises a radiation source generating first radiation, a solid medium capable of high harmonic generation, and a detection arrangement that captures the second radiation scattered by the target. This invention aims to improve measurement accuracy while providing a means to separate different radiation types more effectively.

Career Highlights

Currently, Peter Michael Kraus is employed at ASML Netherlands B.V., a leading company in the semiconductor industry known for its advanced lithography equipment. His work at ASML reflects not only his technical expertise but also his commitment to innovation within the sector. His contributions have been fundamental in pushing the boundaries of metrology apparatus design.

Collaborations

Peter collaborates with talented colleagues such as Sylvianne Dorothea Christina Roscam Abbing and Filippo Campi. These partnerships enable a dynamic exchange of ideas and foster a creative environment conducive to innovation, further enhancing the impact of their collective work in the field.

Conclusion

Peter Michael Kraus stands out as a proficient inventor dedicated to advancing metrology technology. His patent highlights significant strides in the measurement of lithographic targets, proving essential for the semiconductor manufacturing process. With his continued efforts and collaborations, he is poised to contribute even more transformative innovations in the future.

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