Asml Netherlands B.v.

Peter Michael Kraus

Arie Jeffrey Den Boef

Nan Lin

Petrus Wilhelmus Smorenburg

Stefan Michiel Witte

Filippo Campi

ZhuangYan Zhang

Sylvianne Dorothea Christina Roscam Abbing

Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.

Metrology apparatus based on high harmonic generation and associated method

Growing community of inventors

Amsterdam, Netherlands

Peter Michael Kraus