The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 2025

Filed:

Oct. 21, 2019
Applicants:

Applied Materials Israel Ltd., Rehovot, IL;

Tech-nische Universiteit Delft, Delft, NL;

Inventors:

Pieter Kruit, Delft, NL;

Ron Naftali, Shoham, IL;

Jürgen Frosien, Riemerling, DE;

Ralf Schmid, Poing, DE;

Benjamin John Cook, Munich, DE;

Roman Barday, Poing, DE;

Dieter Winkler, Poing, DE;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/147 (2006.01); H01J 37/05 (2006.01); H01J 37/12 (2006.01); H01J 37/20 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/1477 (2013.01); H01J 37/05 (2013.01); H01J 37/12 (2013.01); H01J 37/1475 (2013.01); H01J 37/20 (2013.01); H01J 37/28 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/24592 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A charged particle beam device for irradiating or inspecting a specimen is described. The charged particle beam device includes a charged particle beam source for generating a primary charged particle beam and a multi-aperture lens plate having a plurality of apertures for forming four or more primary. Two or more electrodes having one opening, e.g. having one opening each, for the primary charged particle beam or the four or more primary beamlets are provided. The charged particle beam device further includes a collimator for deflecting a first primary beamlet, a second primary beamlet, a third primary beamlet, and a fourth primary beamlet of the four or more primary beamlets with respect to each other. The charged particle beam device further includes an objective lens unit having three or more electrodes, each electrode having openings for the four or more primary beamlets.


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