The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 2025
Filed:
Feb. 24, 2022
Globalfoundries Singapore Pte. Ltd., Singapore, SG;
Bong Woong Mun, Singapore, SG;
Upinder Singh, Singapore, SG;
Jeoung Mo Koo, Singapore, SG;
Huihua Jiang, Singapore, SG;
GlobalFoundries Singapore Pte. Ltd., Singapore, SG;
Abstract
Structures for an extended-drain metal-oxide-semiconductor device and methods of forming a structure for an extended-drain metal-oxide-semiconductor device. The structure includes a semiconductor substrate, a body well in the semiconductor substrate, a source region in the body well, a drain well in the semiconductor substrate, a drain region in the drain well, and a gate electrode laterally positioned between the source region and the drain region. The drain well includes an edge adjacent to the body well, and the edge of the drain well has a spaced relationship with the body well.