The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2024
Filed:
Jul. 24, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Zuoming Zhu, Sunnyvale, CA (US);
Shu-Kwan Lau, Sunnyvale, CA (US);
Ala Moradian, Sunnyvale, CA (US);
Enle Choo, Saratoga, CA (US);
Flora Fong-Song Chang, Saratoga, CA (US);
Vilen K Nestorov, Pleasanton, CA (US);
Zhiyuan Ye, San Jose, CA (US);
Bindusagar Marath Sankarathodi, San Jose, CA (US);
Maxim D. Shaposhnikov, Sunnyvale, CA (US);
Surendra Singh Srivastava, Santa Clara, CA (US);
Zhepeng Cong, Vancouver, WA (US);
Patricia M. Liu, Saratoga, CA (US);
Errol C. Sanchez, Tracy, CA (US);
Jenny C. Lin, Saratoga, CA (US);
Schubert S. Chu, San Francisco, CA (US);
Balakrishnam R. Jampana, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method for processing a substrate within a processing chamber comprises receiving a first radiation signal corresponding to a film on a target element disposed within the processing chamber, analyzing the first radiation signal, and controlling the processing of the substrate based on the analyzed first radiation signal. The processing chamber includes a substrate support configured to support the substrate within a processing volume and a controller coupled to a first sensing device configured to receive the first radiation signal.