The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2024

Filed:

Aug. 28, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Shao-Kuan Lee, Kaohsiung, TW;

Cheng-Chin Lee, Taipei, TW;

Cherng-Shiaw Tsai, New Taipei, TW;

Kuang-Wei Yang, Hsinchu, TW;

Hsin-Yen Huang, New Taipei, TW;

Hsiaokang Chang, Hsinchu, TW;

Shau-Lin Shue, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/532 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/535 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/45 (2006.01); H01L 29/775 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 23/53276 (2013.01); H01L 21/76834 (2013.01); H01L 21/76837 (2013.01); H01L 21/76852 (2013.01); H01L 21/76897 (2013.01); H01L 23/5226 (2013.01); H01L 23/53295 (2013.01); H01L 23/535 (2013.01); H01L 29/0665 (2013.01); H01L 29/0673 (2013.01); H01L 29/401 (2013.01); H01L 29/41733 (2013.01); H01L 29/42392 (2013.01); H01L 29/45 (2013.01); H01L 29/775 (2013.01); H01L 29/78618 (2013.01); H01L 29/78696 (2013.01);
Abstract

An interconnection structure, along with methods of forming such, are described. The structure includes a dielectric layer, a first conductive feature disposed in the dielectric layer, a second conductive feature disposed over the first conductive feature, a third conductive feature disposed adjacent the second conductive feature, a first dielectric material disposed between the second and third conductive features, a first one or more graphene layers disposed between the second conductive feature and the first dielectric material, and a second one or more graphene layers disposed between the third conductive feature and the first dielectric material.


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