The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2024

Filed:

Apr. 24, 2020
Applicants:

Kwansei Gakuin Educational Foundation, Hyogo, JP;

Toyota Tsusho Corporation, Nagoya, JP;

Inventors:

Tadaaki Kaneko, Hyogo, JP;

Daichi Dojima, Hyogo, JP;

Koji Ashida, Hyogo, JP;

Tomoya Ihara, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 21/08 (2006.01); G01K 1/02 (2021.01); H01L 21/66 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G01B 21/08 (2013.01); G01K 1/026 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01);
Abstract

To provide a new temperature distribution evaluation method, a temperature distribution evaluation device, and a soaking range evaluation method, as the temperature distribution evaluation method which evaluates a temperature distribution of a heating areaA provided in a heating device, the present invention is a temperature distribution evaluation method which, in the heating areaA, heats a semiconductor substrateand a transmitting and receiving bodyfor transporting a raw material to and from the semiconductor substrate, and evaluates a temperature distribution of the heating areaA on the basis of a substrate thickness variation amount A of the semiconductor substrate. Accordingly, temperature distribution evaluation can be implemented for a high temperature area at 1600-2200° C. or the like at which it is hard to evaluate the temperature distribution due to the limit of a thermocouple material.


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