The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Jan. 09, 2023
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Chiao-Hua Cheng, Tainan, TW;
Hsin-Feng Chen, Yilan, TW;
Yu-Fa Lo, Kaohsiung, TW;
Yu-Kuang Sun, Hsinchu, TW;
Wei-Shin Cheng, Hsinchu, TW;
Yu-Huan Chen, Hsinchu, TW;
Ming-Hsun Tsai, Hsinchu, TW;
Cheng-Hao Lai, Taichung, TW;
Cheng-Hsuan Wu, New Taipei, TW;
Shang-Chieh Chien, New Taipei, TW;
Heng-Hsin Liu, New Taipei, TW;
Li-Jui Chen, Hsinchu, TW;
Sheng-Kang Yu, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Abstract
A method for using an extreme ultraviolet radiation source is provided. The method includes performing a lithography process using an extreme ultraviolet (EUV) radiation source; after the lithography processes, inserting an extraction tube into a vessel of the EUV radiation source; and cleaning a collector of the EUV radiation source by using the extraction tube.