The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Mar. 26, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Haosheng Wu, San Jose, CA (US);
Hari Soundararajan, Sunnyvale, CA (US);
Jianshe Tang, San Jose, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Brian J. Brown, Palo Alto, CA (US);
Yen-Chu Yang, Santa Clara, CA (US);
You Wang, Cupertino, CA (US);
Rajeev Bajaj, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A chemical mechanical polishing system includes a platen to support a polishing pad having a polishing surface, a source of coolant, a dispenser having one or more apertures suspended over the platen to direct coolant from the source of coolant onto the polishing surface of the polishing pad; and a controller coupled to the source of coolant and configured to cause the source of coolant to deliver the coolant through the nozzles onto the polishing surface during a selected step of a polishing operation.