The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Mar. 02, 2021
Applicants:

Soitec, Bernin, FR;

Commissariat À L'énergie Atomique ET Aux Énergies Alternatives, Paris, FR;

Inventors:

Didier Landru, Le Champ-près-Froges, FR;

Nadia Ben Mohamed, Echirolles, FR;

Oleg Kononchuk, Theys, FR;

Frédéric Mazen, Saint Egreve, FR;

Damien Massy, Grenoble, FR;

Shay Reboh, Grenoble, FR;

François Rieutord, Saint Egreve, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/762 (2006.01); H01L 21/324 (2006.01); H01L 21/263 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76254 (2013.01); H01L 21/263 (2013.01); H01L 21/324 (2013.01); H01L 21/76251 (2013.01);
Abstract

Substrates may include a useful layer affixed to a support substrate. A surface of the useful layer located on a side of the useful layer opposite the support substrate may include a first region and a second region. The first region may have a first surface roughness, may be located proximate to a geometric center of the surface, and may occupy a majority of an area of the surface. The second region may have a second, higher surface roughness, may be located proximate to a periphery of the surface, and may occupy a minority of the area of the surface.


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