Damien Massy

Title: The Innovative Contributions of Damien Massy

Introduction

Damien Massy is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on methods and substrates that enhance the performance of image sensors.

Latest Patents

One of Damien Massy's latest patents is a method for manufacturing a substrate for a front-facing image sensor. This method involves providing a donor substrate with a semiconductor layer, bonding it to a carrier substrate with an insulating layer, and transferring the semiconductor layer. Additionally, it includes implanting gaseous ions in the carrier substrate and epitaxially growing an additional semiconductor layer. Another patent involves substrates that include useful layers affixed to a support substrate, where the surface of the useful layer has regions with varying surface roughness.

Career Highlights

Throughout his career, Damien Massy has worked with prominent companies in the semiconductor industry, including Soitec and the Commissariat à l'énergie atomique et aux énergies alternatives. His experience in these organizations has allowed him to develop innovative solutions that address the challenges in semiconductor manufacturing.

Collaborations

Damien has collaborated with several professionals in his field, including Nadia Ben Mohamed and Didier Landru. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Damien Massy is a distinguished inventor whose work in semiconductor technology has led to valuable patents and advancements in image sensor manufacturing. His contributions continue to influence the industry and inspire future innovations.