The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
May. 28, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Haosheng Wu, San Jose, CA (US);
Jianshe Tang, San Jose, CA (US);
Hari Soundararajan, Sunnyvale, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Hui Chen, San Jose, CA (US);
Chih Chung Chou, San Jose, CA (US);
Alexander John Fisher, Santa Clara, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 3/10 (2006.01); H01L 21/02 (2006.01); B08B 1/00 (2006.01); B24B 53/017 (2012.01); B24B 37/20 (2012.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
B08B 3/00 (2013.01); B08B 1/001 (2013.01); B08B 3/106 (2013.01); B24B 37/20 (2013.01); B24B 53/017 (2013.01); H01L 21/02057 (2013.01); B08B 2203/007 (2013.01); H01L 21/30625 (2013.01);
Abstract
A method of cleaning for a chemical mechanical polishing system includes directing a gas that includes steam from an orifice onto a component in the polishing system while the component is spaced away from a polishing pad of the polishing system to clean the component, and moving the component into contact with the polishing pad.