The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2023
Filed:
Sep. 13, 2021
Kla Corporation, Milpitas, CA (US);
Stilian Pandev, Santa Clara, CA (US);
Min-Yeong Moon, Ann Arbor, MI (US);
Andrei V. Shchegrov, Campbell, CA (US);
Jonathan Madsen, Los Altos, CA (US);
Dimitry Sanko, Vallejo, CA (US);
Liran Yerushalmi, Zicron Yaacob, IL;
Alexander Kuznetsov, Austin, TX (US);
Mahendra Dubey, Milpitas, CA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
An overlay metrology system may receive overlay data for in-die overlay targets within various fields on a skew training sample from one or more overlay metrology tools, wherein the in-die overlay targets within the fields have a range programmed overlay offsets, wherein the fields are fabricated with a range of programmed skew offsets. The system may further generate asymmetric target signals for the in-die overlay targets using an asymmetric function providing a value of zero when physical overlay is zero and a sign indicative of a direction of physical overlay. The system may further generate corrected overlay offsets for the in-die overlay targets on the asymmetric target signals, generate self-calibrated overlay offsets for the in-die overlay targets based on the programmed overlay offsets and the corrected overlay offsets, generate a trained overlay recipe, and generate overlay measurements for in-die overlay targets on additional samples using the trained overlay recipe.