The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 14, 2023

Filed:

Jan. 04, 2021
Applicant:

Acm Research (Shanghai) Inc., Shanghai, CN;

Inventors:

Hui Wang, Shanghai, CN;

Fufa Chen, Shanghai, CN;

Fuping Chen, Shanghai, CN;

Jian Wang, Shanghai, CN;

Xi Wang, Shanghai, CN;

Xiaoyan Zhang, Shanghai, CN;

Yinuo Jin, Shanghai, CN;

Zhaowei Jia, Shanghai, CN;

Liangzhi Xie, Shanghai, CN;

Jun Wang, Shanghai, CN;

Xuejun Li, Shanghai, CN;

Assignee:

ACM Research, Inc., Shanghai, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/12 (2006.01); H01L 21/02 (2006.01); B08B 7/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); B08B 3/12 (2013.01); B08B 7/026 (2013.01); B08B 7/028 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); H01L 21/67092 (2013.01);
Abstract

A method for cleaning semiconductor substrate without damaging patterned structure on the substrate using ultra/mega sonic device comprising applying liquid into a space between a substrate and an ultra/mega sonic device; setting an ultra/mega sonic power supply at frequency fand power Pto drive said ultra/mega sonic device; before bubble cavitation in said liquid damaging patterned structure on the substrate, setting said ultra/mega sonic power supply at frequency fand power Pto drive said ultra/mega sonic device; after temperature inside bubble cooling down to a set temperature, setting said ultra/mega sonic power supply at frequency fand power Pagain; repeating above steps till the substrate being cleaned. Normally, if f=f, then Pis equal to zero or much less than P; if P=P, then fis higher than f; if the f<f, then, Pcan be either equal or less than P.


Find Patent Forward Citations

Loading…