The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 2023
Filed:
Mar. 30, 2017
Intel Corporation, Santa Clara, CA (US);
Robert A. May, Chandler, AZ (US);
Sri Ranga Sai Boyapati, Chandler, AZ (US);
Kristof Darmawikarta, Chandler, AZ (US);
Hiroki Tanaka, Chandler, AZ (US);
Srinivas V. Pietambaram, Gilbert, AZ (US);
Frank Truong, Gilbert, AZ (US);
Praneeth Akkinepally, Chandler, AZ (US);
Andrew J. Brown, Chandler, AZ (US);
Lauren A. Link, Chandler, AZ (US);
Prithwish Chatterjee, Chandler, AZ (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
An apparatus system is provided which comprises: a photoimageable dielectric layer; a first interconnect structure formed through the photoimageable dielectric, the first interconnect structure formed at least in part using a lithography process; and a second interconnect structure formed through the photoimageable dielectric, the second interconnect structure formed at least in part using a laser drilling process.