The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

Oct. 12, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chieh Hsieh, Taoyuan, TW;

Kuan-Hung Chen, Taoyuan, TW;

Chun-Chia Hsu, Kaohsiung, TW;

Shang-Chieh Chien, New Taipei, TW;

Bo-Tsun Liu, Taipei, TW;

Li-Jui Chen, Hsinchu, TW;

Po-Chung Cheng, Chiayi County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G06F 30/39 (2020.01);
U.S. Cl.
CPC ...
G03F 7/70033 (2013.01); G03F 7/2004 (2013.01); G06F 30/39 (2020.01);
Abstract

An apparatus for generating extreme ultraviolet (EUV) radiation includes a droplet generator configured to generate target droplets. An excitation laser is configured to heat the target droplets using excitation pulses to convert the target droplets to plasma. An energy detector is configured to measure a variation in EUV energy generated when the target droplets are converted to plasma. A feedback controller is configured to adjust parameters of the droplet generator and/or the excitation laser based on the variation in EUV energy.


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